HfO2/SiO2 multilayer enhanced aluminum alloy-based dual-wavelength high reflective optics

Abstract

Laser durable multiband high reflective optics can be attained by depositing HfO2/SiO2 stacks on diamond-turned and optically polished aluminum alloy substrates. HfO2 and SiO2 single layers were prepared using modified plasma-ion assisted deposition. Ellipsometric measurements were performed using two types of variable angle spectroscopic ellipsometry with a combined spectral range of 150nm to 14μm. Optical constants were generated in the entire spectral range. Scatter loss as a function of surface roughness was calculated at 1064nm, 1572nm, and 4.1μm, representing a primary wavelength, a secondary wavelength, and a middle wave infrared band selected for a dual-wavelength laser beam expander, respectively. The surface requirement of the aluminum alloy substrates was determined. Calculated and measured spectral reflectances were compared. Laser-induced damage threshold tests were performed at 1064nm, 20ns, and 20Hz. A laser-induced damage threshold of 47J/cm2 was determined. Post-damage analysis suggests that nodule defects are the limiting factor for the laser-induced damage threshold. Surface modification of the aluminum alloy was identified as a potential technical solution that may further increase the laser damage resistance of the dielectric enhanced dual-wavelength reflective optics.