Abstract
A thermodynamic calculation on the HfB2 coating prepared by chemical vapor deposition (CVD) through HfCl4-BCl3-H2-Ar system was performed, together with the relevant verification experiments. The calculation results indicated that HfB2 coating could be obtained above 900 °C with the ratios of BCl3/HfCl4 and H2/HfCl4 higher than 1 and 12, respectively. The experimental results demonstrated that the deposition temperature, H2 and BCl3 flow rates had significant effects on the grain size, growth rate and phase composition of HfB2 coatings. A dense and uniform HfB2 coating was prepared at 1150 °C with a BCl3/HfCl4 ratio of 3 and a H2/HfCl4 ratio of 20, whose mass and linear ablation rates were 15.61 mg/s and 15.58 μm/s under oxyacetylene flame.
Published Version
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