Abstract
The application of a 300 nm thick platinum silicide (PtSi) layer at the place of the anode contact layer of a soft recovery 2.5 kV/100 A high-power P–i–N diode brought a reduction of the forward voltage drop at several tens percent (for the rating current of 100 A) compared to that of the conventional aluminum and Ti–Ni–Ag layers. This enabled us to greatly improve the trade-off curve between the ON-state and turn-OFF losses of the diode subjected to helium irradiation into the anode and anode junction region. The application of PtSi layers thus opens a new way for the improvement of power devices.
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