Abstract
Track etch rate has been measured as a function of residual range, for various heavy ions (Kr, Xe, Au, Pb, U), in olivine. We discuss the experimental conditions in which this kind of measurement can be free of effects due to the etching process itself, and really reflect the defect structure of the latent tracks. The results are compared with model predictions.
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Schedule a callMore From: International Journal of Radiation Applications and Instrumentation. Part D. Nuclear Tracks and Radiation Measurements
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