Abstract
Mn2V2O7 thin films were deposited onto amorphous glass substrates using a chemical bath deposition method and different deposition time. X-ray diffraction (XRD) analysis was used to define the structure of the films. Their roughness, thickness, and surface properties were evaluated through atomic force microscopy (AFM). The hardness of the films was measured using a nanohardness tester. The film thickness, average grain size, and roughness were positively correlated with each other. These three parameters were observed to increase with the deposition time. The film thickness and average grain size were inversely correlated with the hardness and roughness. In addition, the number of crystallites per unit area and the dislocation density were observed to be positively correlated with the hardness and roughness. This study was designed to elucidate and formalize the underlying reasons for these relationships.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: International Journal of Minerals, Metallurgy, and Materials
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
