Abstract
Bleaching of amorphous silicon films by local heating with a focused laser beam was found to provide a promising optical storage method useful in the fabrication of half-tone optical masks needed in the fabrication of optical diffraction components. A study was made of changes in the optical properties and the structure of a-Si films occurring under the influence of laser radiation. A spatial resolution up to 2000 lines/mm was achieved. A mechanism explaining the experimental results was developed.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
