Abstract
Polycrystalline α-HgI2 films have been grown on TFT substrates using hot-wall vapor phase deposition (HWPVD) with the different growth times. The influence of different growth times (1 hour, 2 hours, 3 hours, 4 hours) on the structural and electrical properties of the polycrystalline α-HgI2 films is investigated. Metallurgical microscope, scan electron microscopes (SEM) and X-ray diffraction (XRD) characterization and the electric transport properties were investigated by the I-V characteristics. The polycrystalline α-HgI2 films growth by 3 hours show more better performance than others. So we use it preparation a detector.Finally, capacitance frequency characteristics analysis showed the detector have good performance.
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