Abstract

In this work, we highlight growth patterns and properties of aerosol-assisted chemical vapor deposition of perovskite, CH3NH3PbI3 thin films. The substrates were distinctly covered with both perovskite and lead iodide thin films which we attribute to methylammonium iodide being the rate limiting step via mass transport. The black perovskite films demonstrated strong absorption and photoluminescence properties confirming their suitability as a light absorbing material for the fabrication of solar cells. Scanning electron microscope images showed dense morphologies along with the confirmation of holes and gaps at reduced growth temperature.

Highlights

  • Tremendous progress at multiple facets of perovskite (PVK) solar cell technologies has resulted in solar to electrical power conversion efficiencies increasing from 3.8% [1] in 2009 to presently in excess of 23% [2]

  • Qi et al introduced hybrid chemical vapor deposition (CVD) through thermal evaporation of lead chloride followed by vapor phase deposition of methylammonium iodide (MAI) [5]

  • Keeping the PbI2/MAI molar ratio fixed at 1:1 in DMF, AACVD experiments were performed on 1.1 mm borosilicate glass in a tube furnace

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Summary

Introduction

Tremendous progress at multiple facets of perovskite (PVK) solar cell technologies has resulted in solar to electrical power conversion efficiencies increasing from 3.8% [1] in 2009 to presently in excess of 23% (for PVK/silicon solar cells) [2]. Attempts to deposit high-quality optoelectronic PVK layers by one or two-step solution processes such as spin coating are widely spread [3,4], challenging to scale up. To meet the challenge of industrial scale, cost-effective deposition of dense PVK coatings use of the chemical vapor deposition (CVD) processes would be highly desirable. The atmospheric pressure deposition technique is suited to use in industry due to the high volume, continuous growth processes and fast growth rates achievable. We consider a range of CVD deposition parameters (deposition temperature, substrate placements and precursor delivery) and their effects on the resulting PVK films. We highlight some distinct growth observations during the attempted deposition of PVK films and some resulting properties that have not been studied previously in CVD experiments. IEC - type K thermocouple was used to measure the surface temperature of the films

Deposition of Thin films
Characterisation
Results and Discussion
Conclusions
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