Abstract
Three-dimensional (3D) nanowire (NW) networks are promising architectures for effectively translating the extraordinary properties of one-dimensional objects into a 3D space. However, to uniformly grow NWs in a 3D confined space is a serious challenge due to the coupling between crystal growth and precursor concentration that is often dictated by the mass flow characteristic of vapor or liquid phase reactants within the high-aspect ratio submicrometer channels in current strategies. We report a pulsed chemical vapor deposition (CVD) process that successfully addressed this issue and grew TiO(2) nanorods uniformly covering the entire inner surface of highly confined nanochannels. We propose a mechanism for the anisotropic growth of anatase TiO(2) based on the surface-reaction-limited CVD process. This strategy would lead to the realization of NW-based 3D nanoarchitectures from various functional materials for the applications of sensors, solar cells, catalysts, energy storage systems, and so forth.
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