Abstract
Zirconia coatings were produced by reactive dc magnetron sputter deposition, using a system with multiple sputter sources and a biased substrate stage. Tetragonal zirconia with either a random orientation or a highly (111) preferred orientation was formed by applying a substrate bias. Coating grown with no substrate bias had the equilibrium monoclinic structure. X‐ray diffraction and transmission electron microscopy analyses revealed that bias sputtering could effectively decrease crystalline size in the as‐deposited coating, which resulted in room‐temperature stabilization of the tetragonal phase. The fraction of tetragonal phase, the desired phase for transformation‐toughening behavior, was strongly dependent on the substrate bias and post‐deposition annealing temperature.
Published Version
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