Abstract
The growth of self-assembled InAs quantum dots on implantation doped GaAs was studied. Be and Si ions were implanted in a combined ion implantation/molecular beam epitaxy process to generate p- and n-type GaAs, respectively. The quality of the InAs quantum dots was investigated by photoluminescence spectroscopy and scanning electron microscopy. By employing an in situ annealing step before re-growth it was possible to fabricate high quality InAs quantum dots on ion doped GaAs for Be doses up to 1.4×10 14 cm −2. The sheet resistance of the Be doped GaAs was as low as 1 kΩ at 300 K and 0.6 kΩ at 4.2 K, respectively. Only for rather low Si doses up to 5×10 13 cm −2 acceptable photoluminescence could be detected. The sheet resistance for these doses was 1 kΩ at 300 K and 1.7 kΩ at 4.2K.
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