Abstract
GaInAs/InP wafers with a thick active layer (0.5-2.0 µm) were grown by chemical beam epitaxy (CBE). Stripe-contact lasers were fabricated to evaluate these wafers. The lowest normalized threshold current density obtained was 7.9 kA/cm2·µm for devices with a 2.0 µm thick active layer. This value is almost acceptable for application to surface emitting lasers.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Paper version not known
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
