Abstract
The growth mode, strain state and shape of Ge islands were analyzed in situ, during their growth on Si(001), by combining Grazing Incidence Small Angle X-ray Scattering (GISAXS) and Grazing Incidence X-ray Diffraction (GIXD) measurements. GISAXS measurements provide the detailed evolution of the shape of the grown quantum dots (QDs). GIXD allows the monitoring of the island nucleation and the strain state of the QDs. The shape, size, strain and interdiffusion are found to strongly depend on the growth temperature between 773 K and 923 K. At low T, the 3D islands are small, nearly fully relaxed and do not strain the substrate. At higher T, larger islands with significant Si content are grown, and induce deformation in the silicon substrate.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
