Abstract
In this article, the authors discuss the mechanism of InGaN growth by plasma assisted molecular beam epitaxy. They present the evidence of the influence of substrate miscut on indium incorporation for the growths with different gallium fluxes. They propose and discuss the phenomenological model which describes the incorporation of indium into InGaN layers grown under the indium-rich conditions that takes into account following parameters: gallium and nitrogen fluxes, miscut angle, and the growth temperature.
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Schedule a callMore From: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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