Abstract
The question of the validity of the scaling ansatz in discrete deposition models and their connection with the scaling exponents of continuum differential equations is addressed. We specifically focus on the scaling properties of the Wolf–Villain type models and, as an extension of this model, on the influence of attractive and repulsive interactions up to second neighbors on the scaling relation. As an example of technological relevance, we present the evolution of steps in the vicinal (100) surface of Si during deposition at relatively low temperatures. We have found that, in general, one should not expect that discrete models, as well as real crystals, exhibit scaling.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
