Abstract
Strontium barium niobate (Sr x Ba1–x Nb2O6, referred to as SBN) is a material of interest for making efficient optical modulators due to its very high electro‐optic (EO or Pockels) coefficient. SBN is a ferroelectric with a Curie temperature that varies between 20 and 80 °C, depending on its Sr/Ba ratio. Structurally, it belongs to the tetragonal tungsten bronze family. The successful integration of SBN on Si in textured epitaxial form using molecular beam epitaxy via a SrTiO3 (STO) buffer layer is reported. X‐ray diffraction and scanning transmission electron microscopy are used to analyze the crystalline quality, STO/SBN interface structure, and preferred orientations of the SBN film. Thin, highly oriented SBN films integrated on Si have potential applications in low power and small footprint integrated Si photonics.
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