Growth and microstructures of carbon nanotube films prepared by microwave plasma enhanced chemical vapor deposition process

Abstract

Well-aligned carbon nanotubes (CNTs) were grown on iron coated silicon substrates by microwave plasma enhanced chemical vapor deposition. Effect of plasma composition on the growth and microstructures of CNTs were investigated by scanning electron microscopy, transmission electron microscopy, Raman spectroscopy and optical emission spectroscopy. Morphology and microstructure of nanotubes were found to be strongly dependent on the plasma composition. Aligned bamboo-shaped nanotubes consisting of regular cone shaped compartments were observed for C2H2/NH3/N2 and C2H2/NH3/H2 gas mixtures. Randomly oriented or no nanotubes growth were observed in C2H2/H2 and C2H2/N2 gas mixtures respectively. CNTs grown in nitrogen rich plasma had more frequent short compartments while compartment length increased with decreasing nitrogen concentration in the plasma. Raman spectroscopy of CNTs samples revealed that CNTs prepared in nitrogen rich plasma had higher degree of disorder than those in low nitrogen or nitrogen free plasma. In-situ optical emission spectroscopy investigations showed that CN and H radicals play very important role in both the growth and microstructure of CNTs. Microstructure of CNTs has been correlated as a function of CN radical concentration in the plasma. It is suggested that presence of nitrogen in the plasma enhances the bulk diffusion of carbon through the iron catalyst particles which causes compartment formation. Based on our experimental observations, growth model of nanotubes under different plasma composition has been suggested using base growth mechanism.