Abstract

Rhombohedral (R-) and tetragonal-like (T-) BiFeO3 (BFO) mixed-phase thin films and single R-phase BFO thin films have been grown on SrRuO3-buffered SrTiO3 (STO) (001) substrate by ion beam sputtering. From X-ray diffraction study, it was found that T-BFO and R-BFO mixed-phase thin films can be grown at a low oxygen partial pressure of 1 mPa, and the lattice parameters of the T-BFO and R-BFO were a = 0.381 nm, c = 0.461 nm (c/a = 1.22), and a = 0.394 nm and c = 0.400 nm (c/a = 1.02), respectively. High-resolution high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM) observation and energy dispersive X-ray analysis (EDXA) mappings have revealed a clear T-BFO lattice and a–c domain in the middle of the thin films. However, Bi-rich and Fe-rich secondary phases were also found with the T-BFO phase. Therefore, it can be concluded that secondary phases such as Bi2O3 or Bi-poor phase are needed for T-BFO formation on STO (001) substrate, and the a–c domain formation does not occur by stress relaxation but matching of the growth directions of different domains.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call