Abstract
Molybdenum oxide thin films have been successfully prepared by direct UV irradiation of amorphous films of a molybdenum dioxide acetylacetonate complex on Si(1 0 0) substrates. Photodeposited films were characterized by X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) and the surface morphology examined by Atomic Force Microscopy (AFM). It was found that as-photodeposited films are uniform and smooth, with thickness of 350 nm, with rms surface roughness of 28 nm and contain non-stoichiometric oxides (MoO 3− x ). The results of XRD analysis showed that post-annealing of the films in air at 450 °C transforms the sub-oxides to α-MoO 3 phase with a much rougher surface morphology (rms = 144 nm). The as-photodeposited MoO 3− x films are amorphous, and exhibit better optical quality than annealed films.
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