Abstract
MOCVD growth and characterization of InAs-rich GaInAsSb on GaSb substrates was investigated. High quality mirror-like surfaces with a minimum lattice mismatch of 0.4% was obtained. The surface of InAs-rich GaInAsSb epilayer shows morphological features much different from that of GaSb-rich films. Solid compositions of InAs-rich films were dependent on growth temperature. InAs-rich GaInAsSb shows n-type conduction, which is the opposite of GaSb-rich samples. A room temperature electron mobility of 5000 cm 2/V·s with electron concentration of 3.6×10 17 cm −3 was obtained.
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