Abstract
Metallic multilayers with specific materials configurations have been shown to exhibit giant magnetoresistance effect at room temperature. In this study, microstructural analysis was carried out on magnetron sputtered Co/Cu multilayers using various diffraction and imaging techniques. Dominant characteristic features associated with the multilayers, such as lateral and vertical columnar grain orientations as well as layer undulation and regularity were identified. By deliberately introducing microstructural changes using a buffer layer and via heat treatment, detailed microstructural analysis carried out on the multilayers has provided an insight into the dependence of giant magnetoresistance on the observed microstructures. The present study shows that high giant magnetoresistance effect of the multilayers was associated with highly correlated interfacial profiles, sharp columnar grain boundaries and high degree of lateral coherency in columnar grain growth. While the introduction of iron buffer layer favoured the growth of these structural features that were responsible for large giant magnetoresistance effect, annealing led to deterioration of giant magnetoresistance property of the multilayers.
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