Abstract

Diamond coatings were deposited by hot filament chemical vapor deposition on high speed steel substrates. Iron boride diffusion barrier and WC–Co layers were used as interlayers. At high deposition pressure, the quality of the diamond deposits is poor due to the extensive formation of graphitic deposits. At low pressure, diamond films of better quality were obtained, but their adhesion to the substrate was insufficient. A two-step deposition process at low pressure was developed. In a first deposition step performed at high methane percentage, a high nucleation density was achieved. In a second deposition step, the methane percentage was reduced to achieve continuous, dense, and adherent diamond layers on borided or WC–Co coated high speed steel substrates. Adhesion of these diamond layers on the surface modified high speed steel substrates was tested based on reciprocating sliding tests.

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