Abstract
A light-emitting diode (LED) structure based on group III nitride has been grown for the first time on Si(111) substrate with SiC buffer nanolayer (50- to 200-nm-thick) obtained by solid-phase epitaxy. This LED structure is characterized by record low (<108 cm−2) density of lattice misfit dislocations at a total dislocation density of ∼8 × 108 cm−2. The photo- and electroluminescence spectra of obtained structures have been measured.
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