Abstract
We report a method to fabricate high-quality patterned magnetic dot arraysusing block copolymer lithography, metal deposition, and a dry lift-off technique.Long-range order of cylindrical domains oriented perpendicular to the substrate andin hexagonal arrays was induced in the block copolymer films by prepatterningthe substrate with topographic features and chemically modifying the surfaceto exhibit neutral wetting behaviour towards the blocks of the copolymer. Theuniformity of the domain size and row spacing of block copolymer templates created inthis way was improved compared to those reported in previous studies that usedgraphoepitaxy of sphere-forming block copolymers. The pattern of block copolymerdomains was transferred to a pattern of magnetic metal dots, demonstrating thepotential of this technology for the fabrication of patterned magnetic recordingmedia.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
