Abstract
We have considered normal grain growth in thin films attached to a substrate and shown that shear-coupled grain boundary migration results in the build-up of elastic stresses in the film. We proposed a semi-quantitative model of grain growth, combining the elements of disclinations theory with the Burke-Turnbull model of normal grain growth. We have shown that shear-coupled grain boundary migration may lead to stagnation of normal grain growth, whereas for high coupling factor values, the grains in the film do not grow at all. Finally, we discussed the possible mechanisms of stress relaxation and resulting activation energies of grain growth.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
