Gradual tilting exposure photo and nano lithography technique

Abstract

We report a novel tilting exposure photolithography (TEL) technique where gradual pattern displacement is employed to achieve high-resolution features over large areas with reasonable exposure times. A linear array with features of the order of 100 nm has been realized using this technique with standard blue-light LED sources. TEL can be useful in the visible and ultraviolet spectra to create two-dimensional periodic structures. The created structures include the nanometric array of spots and lines. The proposed technique can be used as a writing method where complex features can be generated by moving the sample-holding leading to serpentine nanometric linear arrays.