Abstract
AbstractWe report the fabrication and characterization of porous Si templates for electrodeposition of Au high aspect ratio nanostructures. The templates with ordered and controlled pore size, 4 µm and 50 nm in diameter, were created through Si etching. Electrodeposition of Au into macroporous Si and into mesoporous Si was investigated. The different morphologies of deposits depending on the Si type and pore size were compared and discussed. The morphology and structural characteristic of the fabricated nanostructures were analyzed using scanning electron microscopy. The micrographs confirm that the deposition parameters have a strong influence on morphology of the structures. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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