Abstract
Czochralski silicon (Cz Si) crystals with germanium (Ge) doping are considered to be of potential application for integrated devices. In this presentation, the influence of Ge doping of Cz Si crystals on oxygen precipitate thermal stability has been discussed. Compared with the conventional Cz Si, oxygen precipitates in Ge-doped Cz (GCz) Si was proposed to be poorer stable thermally during high temperature anneals, which is ascribed to the formation of smaller precipitates. Meanwhile, the oxygen precipitation was promoted in GCz Si wafers that received a high temperature pre-anneal treatment, which has been considered to be associated with the assumption of Ge-related complexes by the intended Ge doping.
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