Generation of Uniform X-ray Illumination and Its Application to X-ray Diffraction Microscopy

Abstract

X-ray diffraction microscopy (XDM) is an established lens-less imaging method extensively practiced at synchrotrons and X-ray free-electron lasers (XFELs). XDM is broadly operated in two different modes: scanning and non-scanning. The non-scanning mode of operation in XDM is commonly called coherent diffraction imaging (CDI) and has been the key research direction of many XFEL facilities. This method typically images objects smaller than the size of the illumination, which precludes the imaging of a large group of samples physically larger than the illumination. Furthermore, satisfying this requirement at X-ray free-electron lasers tremendously reduces the volume of practically useful data, leading the experimental scheme to be less efficient. Such a limitation can be circumvented by using a uniform illumination probe rather than the traditional Gaussian-focused probe from the X-ray focusing optics. Here in this article, we report a numerical study on the design of an optical element to generate uniform X-ray illumination and its application to the CDI. We demonstrate the benefits of such illumination in imaging objects that are larger than the illumination size and in improving the efficiency of the experimental scheme overall.