Abstract
We have been developing high intensity vacuum ultraviolet (VUV) laser system for advanced applications such as micro and precise processing and photochemical reactions. We propose and construct a new VUV laser system to generate an output energy of sub mJ with a pulse width of subpicosecond at the wavelength of 126nm. A seed pulse was generated in Xe as the 7th harmonics of a 882 nm Ti:sapphire laser, and the Ar2* amplifier media were generated in an optical-field-induced ionization Ar plasma produced by another 785 nm Ti:sapphire laser. The VUV radiation should be further amplified in a discharge-pumped Ar2* amplifier, which is under construction.We have been developing high intensity vacuum ultraviolet (VUV) laser system for advanced applications such as micro and precise processing and photochemical reactions. We propose and construct a new VUV laser system to generate an output energy of sub mJ with a pulse width of subpicosecond at the wavelength of 126nm. A seed pulse was generated in Xe as the 7th harmonics of a 882 nm Ti:sapphire laser, and the Ar2* amplifier media were generated in an optical-field-induced ionization Ar plasma produced by another 785 nm Ti:sapphire laser. The VUV radiation should be further amplified in a discharge-pumped Ar2* amplifier, which is under construction.
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