Generation and amplification of ultra-short-pulsed vacuum ultraviolet radiation

Abstract

We have been developing an ultra-short-pulsed vacuum ultraviolet (VUV) laser system for advanced applications such as micro and precise processing and photochemical reactions. We propose and construct a new VUV laser system to generate output energy of sub-mJ with a pulse width of sub-picosecond at the wavelength of 126 nm. A VUV seed pulse was generated in Xe gas at the pressure of 1.2 Torr with high conversion efficiency as the 7th harmonics of a 882 nm Ti:Sapphire laser. The Ar2* amplification medium was generated in an optical-field-induced ionized Ar plasma pumped by another 800 nm Ti:Sapphire laser with an amplification factor of 400. VUV output at 1 µJ in the sub-picosecond pulse will be obtained at a repetition rate of 1 kHz, leading to an average power of 1 mW at 126 nm. It will be useful VUV coherent source for applications of precise and micro laser processing.We have been developing an ultra-short-pulsed vacuum ultraviolet (VUV) laser system for advanced applications such as micro and precise processing and photochemical reactions. We propose and construct a new VUV laser system to generate output energy of sub-mJ with a pulse width of sub-picosecond at the wavelength of 126 nm. A VUV seed pulse was generated in Xe gas at the pressure of 1.2 Torr with high conversion efficiency as the 7th harmonics of a 882 nm Ti:Sapphire laser. The Ar2* amplification medium was generated in an optical-field-induced ionized Ar plasma pumped by another 800 nm Ti:Sapphire laser with an amplification factor of 400. VUV output at 1 µJ in the sub-picosecond pulse will be obtained at a repetition rate of 1 kHz, leading to an average power of 1 mW at 126 nm. It will be useful VUV coherent source for applications of precise and micro laser processing.