Abstract
Growth of Ge2Sb2Te5 phase-change films on flexible polyimide substrates by pulsed laser deposition (PLD) is demonstrated. The effect of annealing temperature on the crystalline nature of the films was studied. A decrease of (200) lattice plane distance with the increase of annealing temperature was revealed for the films grown on both polyimide and Si substrates, which was related to tensile stress in the crystallized films. Optical reflectivity measurements showed a high reflectivity contrast between full crystalline and amorphous films. The results indicate an excellent potential for applications of these PLD-deposited Ge2Sb2Te5 films on flexible polyimide substrates in optical data storage.
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