Abstract

We demonstrate a large-area red-emitting vertical-cavity surface-emitting laser (VCSEL) structure with significant improvement in the uniformity of charge carrier distribution by adopting a Si-doped $ {{\rm Al}_{0.20}}{\rm GaInP} $Al0.20GaInP current spreading layer and a bottom disk contact. The new structure emitting at 670 nm with a bottom disk contact diameter of 20 µm was compared with the conventional oxide-confined top-emitting structure with a similar aperture size. The maximum output peak power increased from 8.8 mW to 22.5 mW under pulsed-mode operation at room temperature. The far field improved from a strong multiple-mode pattern to a Gaussian-like profile. The corresponding divergence angle of the far-field pattern at $ 2{\rm {I}}_{\rm{th}} $2Ith injection current reduced from 16.2° to 10.9°.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call