Abstract
High carrier density part of many materials could be accessed by a variation of the field effect transistor technique: electric double layer transistor. Carrier density regime of n∼1014 cm−2 can be easily accessed electrostatically realizing effective doping without chemical modification. In this study, we utilized micro-cleavage on a number of interesting layered materials. And realized high carrier density state and high performance transport on atomically flat surfaces.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
