Gate Stack Engineering in MoS2 Field‐Effect Transistor for Reduced Channel Doping and Hysteresis Effect

Abstract

Abstract2D transition metal dichalcogenides (TMDs) are promising semiconductive films for applications in future devices due to their prosperous and tunable band structures. However, most TMD‐based top gate transistors suffer from a significant doping effect in the channel due to the subsequent deposition high‐k dielectric layer and metal gate, which limits their practical applications. In this work, the channel doping effect caused by various processing steps based on mechanical exfoliated MoS2 sheets is systematically investigated. This work illustrates a clear correlation among these steps and provides a simple and efficient methodology to realize high‐performance enhancement mode MoS2 field effect transistors, which can be extended to other 2D materials.