Gate Stack Analysis of Nanosheet FET for Analog and Digital Circuit Applications

Abstract

This manuscript demonstrates the performance comparison of vertically stacked nanosheet FET with various high-k materials in gate stack (GS) configuration. As the high-k dielectric materials are inevitable to continual scaling, in this paper, various high-k dielectric materials such as Si3N4, Al2O3 and HfO2 are incorporated in the GS, and the performance is studied. Further, DC and Analog/RF performance metrics are discussed in detail, and it is noticed that by using HfO2 in high-k GS, the on current (I ON) is enhanced by 46.7% and off current (I OFF) is decreased by 81.6% as compared to conventional NSFET (C-NSFET) without high-k GS. Also, the switching ratio (I ON/I OFF) is increased by 8× from SiO2 to HfO2, ensuring good logic applications. Moreover, compared to the C-NSFET, GS-NSFET with HfO2 offers better values for analog metrics like transconductance (gm) and transconductance generation factor (TGF). However, as the k value increases, the capacitances are also observed to be increased. As a result, the intrinsic delay (τ) increases by 9%, 6% and 20% from SiO2 to Si3N4, Si3N4 to Al2O3, Al2O3 to HfO2, respectively. On top of that, the circuit level demonstration is also performed for resistive load based inverter and ring oscillator (RO) for both C-NSFET GS NSFET with HfO2 as GS material. From circuit analysis, it is observed that by using the GS, the performance of the inverter is increased in terms of noise margins and DC gain. However, the oscillation frequency (f OSC) of 3-stage RO is decreased by 14.7% with the incorporation of GS owing to the increment in gate capacitance (Cgg). Consequently, the results will give deep insights into the performance analysis of NSFET with various high-k materials in gate stack at both device and circuit levels.