Abstract
Focused electron beam induced deposition (FEBID) is a flexible direct-write method to obtain defined structures with a high lateral resolution. In order to use this technique in application fields such as plasmonics, suitable precursors which allow the deposition of desired materials have to be identified. Well known for its plasmonic properties, silver represents an interesting candidate for FEBID. For this purpose the carboxylate complex silver(I) pentafluoropropionate (AgO2CC2F5) was used for the first time in FEBID and resulted in deposits with high silver content of up to 76 atom %. As verified by TEM investigations, the deposited material is composed of pure silver crystallites in a carbon matrix. It showed good electrical properties and a strong Raman signal enhancement. Interestingly, silver crystal growth presents a strong dependency on electron dose and precursor refreshment.
Highlights
The fabrication of defined patterns in the nanometer regime demands techniques with high lateral resolution and preferably as few processing steps as possible
Despite the larger electron density in the primary electron (PE) beam area, the silver content was low in the PE region compared to the halo for Focused electron beam induced deposition (FEBID) dots
Deposits with a high silver content were obtained with a focused electron beam
Summary
The fabrication of defined patterns in the nanometer regime demands techniques with high lateral resolution and preferably as few processing steps as possible. Focused electron beam induced deposition (FEBID) is a flexible direct-write method to obtain defined structures with a high lateral resolution.
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