Abstract
AbstractThe preparation of photosensitive allyl resins is described. The introduction of cinnamoyl groups into allyl resins is attempted for imparting successfully photosensitive functionality. Thus, the photosensitivity of cinnamoylated poly(allyl benzoate) was first examined in detail as a model photoreaction of cinnamoylated allyl resins. Cinnamoylated poly(diallyl phthalate) was then UV‐irradiated to yield crosslinked resin, and its photosensitivity was compared with that of other allyl resins. The highest photosensitivity was observed for cinnamoylated poly(diallyl phthalate), although the mobility of the main polymer chain was considered to be lowest; this may be ascribed to the function of phthaloyl groups as photosensitizers.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
