Abstract
Bottom-Up Fabrication In article number 2103708, Joon-Ho Oh, Ka-Hyun Kim, and co-workers present the unprecedented fabrication of crystalline silicon wafers and solar cells by a fully bottom-up growth method without wasting substrate, in contrast to conventional technologies that sacrifice large amounts of raw material. A plasma-assisted epitaxially grown silicon seed layer with a self-organized nanogap is key for the realization of the fully bottom-up process. The results represent a technological breakthrough in advanced silicon microelectronics and photovoltaics.
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