Abstract
In this work, dual implantation of Cr+ and N2+ ions on electroplated Ni substrates have been investigated for N2+ implantation energies of 140keV, 100keV and 60keV. The implanted specimens have been analyzed by glow discharge optical emission spectroscopy, X-ray diffraction, nano-indentation, coefficient of friction, nano-wear and potentiodynamic corrosion curves. The properties of the dual implanted samples have been compared to Cr+ or N2+ implanted specimens.The microstructural and mechanical properties of the Ni plates depend on the penetration ranges of the Cr and N atomic profiles obtained after the implantation process. The increase of hardness reduced the coefficient of friction of the samples and the wear rates. Preferential formation of Cr–N over Ni–N compounds has been observed when the Cr and N atomic profiles coexist within the Ni matrix.The potentiodynamic corrosion curves in acidic solutions revealed that the presence of Me–N species is detrimental for the chemical stability of the plates. Both nano-wear and corrosion properties are optimized when a Ni–N sublayer is formed underneath a top Cr–Ni implanted film. This is achieved by tuning the implantation energies of Cr+ and N2+ ions at 140keV. This bilayer structure could be a suitable treatment for micro-embossing dies for plastic texturing processes.
Published Version
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