Abstract
We developed a fabrication method for free-standing metal structures with high aspect ratios to manufacture inductive grid filters for infrared rejection. Deep grooves in thermally evaporated SiO 2 layer, fabricated by electron beam lithography and etching, were filled with iridium by atomic layer deposition technique. Characterization shows that the fabricated structures can suppress infrared radiation over two orders of magnitude while transmitting 40% of XUV radiation.
Published Version
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