Abstract
A Fourier optics calculation of image formation in low energy electron microscopy(LEEM) is presented. The adaptation of the existing theory for transmission electronmicroscopy to the treatment of LEEM and other forms of cathode lens electronmicroscopy is explained. The calculation incorporates imaging errors that are caused bythe objective lens (aberrations), contrast aperture (diffraction), imperfect sourcecharacteristics, and voltage and current instabilities. It is used to evaluate theappearance of image features that arise from phase objects such as surface steps andamplitude objects that produce what is alternatively called amplitude, reflectivityor diffraction contrast in LEEM. This formalism can be used after appropriatemodification to treat image formation in other emission microscopies. Implications forimage formation in the latest aberration-corrected instruments are also discussed.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
