Abstract
We have developed a multiple beam Extreme Ultraviolet (EUV) interference lithography system to create two-dimensional periodic structures. A spatially coherent EUV beam from an undulator source is diffracted by several transmission gratings, which were written by electron beam lithography. Interference pattern due to the diffracted beams is recorded on a photoresist coated substrate. Square array of holes with a 141-nm periodicity were written in initial tests. In this paper, we discuss the potential of this technique for extremely high-resolution patterning and issues related to illumination coherence and polarization.
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