Abstract
The paper studies the regularities of silicon coatings formation on a substrate of an alloy based on nickel titanium using the radio-frequency (RF) magnetron sputtering method. It is shown that the use of the RF magnetron sputtering method allows making a silicon coating with a thickness more than 6 μm. It is determined that treatment time has the main influence on the thickness of a coating. The magnitude of the RF-power level of magnetron sputtering has a smaller effect on the thickness of the emerging coating.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
