Abstract
Epitaxial islands of C49-phase TiSi2 of up to 100 nm in size, and with a single crystallographic orientation, have been fabricated on Si(001) substrates. The growth process involves passivation of the Si surface using Sr, followed by deposition of Ti in the form of SrTiO3, which prevents the reaction between Ti and Si. Decomposition of SrTiO3 at temperatures above 800 °C drives off Sr and O completely, leaving epitaxial islands of TiSi2 dispersed on the Si surface. The TiSi2 islands have (010) orientation and an in-plane epitaxial relationship of Si[110]∥TiSi2[100]. Density functional calculations of the surface and interface energies show that the island sizes and contact angles are consistent with surface energy minimization.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
