Abstract
AbstractThe fabrication of nanoscopic silicon based membranes has been carried out by using a non‐expensive electrochemical preparation technique. For these purposes an n+‐silicon wafer is anodized to create oriented pores with typical diameters around 50 nm. The length of the channels is up to 50 μm which yields to an aspect ratio of 1000. The channels of these templates are partially filled with a metal, especially a ferromagnetic one to obtain an array of nanostructures. Metal‐deposition within such high aspect ratio pores is a great challenge but could be realized in some extent. The introduced silicon based nanocomposite offers the opportunity to change between different nano‐architectures by accurate adjustment of the electrochemical fabrication parameters. Also the size and spatial distribution of the precipitated metal‐structures within the pores can be varied by altering the galvanic deposition process. Different morphologies and varying metal fillings modify the physical properties (e.g. magnetic behaviour) of the nanocomposite system. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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