Formation of Quantum Wires by Strain-Induced Lateral-Layer Ordering Process: Growth Mechanism and Device Applications

Abstract

AbstractGaxIn1−xAs and GaxIn1−xP quantum wire (QWR) arrays were grown by a single-step molecular beam epitaxy. Lateral Ga(In composition modulation perpendicular to the growth direction occurs spontaneously during the growth of (GaAs)m/(InAs)n or (GaP)m/(InP)n shortperiod superlattices on InP or GaAs substrates, respectively, by the strain-induced lateral-layer ordering (SILO) process, producing lateral quantum wells. This straightforward method employs standard on-axis (001)-oriented substrates, and requires no pre-growth substrate patterning, nor does it involve post-growth processing for the formation of QWRs. Both GaxIn1−xAs infrared (1.7 μm) lasers and GaxIn1−xP visible (0.7 μm) lasers with QWR active regions have been successfully fabricated. These lasers showed many unique features that have never been observed in quantum well lasers.