Abstract
In this work, a process solution for the formation of an array of piezo- and pyroelectric structures with the use of a matrix of nanoprofiled silica is demonstrated. It is proposed to use plasma etching through a hard mask of porous anodic alumina for the formation of the matrix. Nanoparticles of a ferroelectric copolymer of vinylidene fluoride with trifluoroethylene are formed in the pores of the matrix. The results of measurements of the piezoelectric and pyroelectric responses of this structure are presented.
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