Abstract
Nickel ferrite (NiFe2O4) thin films are of potential interest for magnetic applications. In the present study, the production of NiFe2O4 by solid-state reaction between thin films of hematite (α-Fe2O3) and nickel oxide (NiO) on (0001) sapphire (α-Fe2O3) substrates has been examined. The NiFe2O4 thin films were prepared by two different methods. In the first case the NiFe2O4film was grown in situ in the deposition system, while in the second case the NiFe2O4 film was formed ex situ by reacting at elevated temperatures in air. These two methods of reaction lead to interesting morphological differences in the ferrite layers.Epilayers of α-Fe2O3 followed by NiO were deposited onto (0001) α-Al2O3 by pulsed-laser deposition (PLD) in 6 mTorr O2. NiFe2O4 films were obtained by reacting the starting films in two different ways: in situ (during film growth) and ex situ.. In both cases, the α-Fe2O3 films were grown under the same conditions while those for the deposition of the NiO layers were different.
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