Abstract
The formation of amorphous anodic films at constant current is investigated for sputtering-deposited Al–Ti alloys containing from 3–30 at.% Ti. The films were grown at high efficiency in a borate electrolyte and comprised a main region containing units of Al 2O 3 and TiO 2, with a thin surface region enriched in titanium species. The formation ratios of the films increased with increase of titanium content of the alloys. The presence of the outer region is explained by the faster migration of Ti 4+ ions relative to that of Al 3+ ions through the films.
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